Abstract:
The Spray Pyrolysis set-up was established and thin films of BSCCO (2212) were prepared on three substrate, i.e., Quartz, Silicon wafer and LaA1203. Th1 set of parameters, i.e., deposition temperature, substrate to nozzle distance and flow rate were varied. The heat treatment was given at different temperatures. The annealing time and annealing temperature of the film were varied. The emphasis was to optimize the conditions for the formation of BSCCO (2212) phase. The XRD Graph and SEM Photo Micrograph were taken to study the phase formation and Microstructure of the film.
