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In recent years, Ni-Mn-X (X: In, Sb) based ferromagnetic shape memory alloys
(FSMAs) showing a reversible first-order martensitic phase transformation between high
symmetry austenitic phase to low symmetry martensitic phase accompanied with a macroscopic
shape change, have attracted increasing scientific attention as multifunctional materials due to
their large magnetic-field-induced strains (MFIS) by the rearrangement of twin variants in the
martensite and as potential candidates for high sensitivity magnetic actuators and sensors. These
alloys exhibit various magnetic field-driven properties such as magnetic shape memory effect,
martensitic phase transformation, exchange bias effect and magnetocaloric effect etc. So far,
numerous groups have studied these magnetic field-driven properties in bulk FSMAs. For
emerging micro devices such as magnetically driven microelectromechanical systems (MEMS)
and even microscopic machines, high quality FSMA thin films grown on semiconductor
substrates are required. It is desirable to establish the process for producing high quality thin
films of these materials for their integration into emerging technologies.
The main objective of the present work was to synthesize nanostructured ferromagnetic
shape memory alloy thin films of Ni-Mn-X (X: In, Sb) on Si (100) substrate using DC
magnetron sputtering technique to investigate the structural, phase transformation, magneticand
mechanical properties of these films. In addition Ni-Mn-Sb/CrN heterostructures were
fabricated and the effect of varying thickness of CrN layer on various properties of
heterstructure was studied. A chapter - wise summary of the thesis is given below:
Chapter 1 gives an overview of ferromagnetic shape memory alloys and material
background. This chapter includes literature survey on physical properties of Ni-Mn-X (X: In,
Sb) ferromagnetic shape memory alloys and their thin films. The fourth element addition,
exchange bias and magnetocaloric effect properties of FSMAs have been discussed.
Chapter 2 presents the details of experimental techniques, which we have used for the
synthesis and characterization of these films. The synthesis of thin films in present thesis has
been carried out by DC magnetron sputtering technique. Various sputtering parameters were
optimized in order to obtained good quality FSMA films. X-ray diffraction technique has been
used for phase identification and crystallite size analysis. The surface morphology and
microstructure of thin films were studied using Atomic Force Microscopy (AFM) and Field
Emission Scanning Electron Microscopy (FESEM). The film thickness was measured using
cross-sectional FESEM. The temperature and field dependent magnetization (M-T and M-l-1)
measurements of thin films were studied using Cryofree Vibrating Sample Magnetometer
(VSM) and SQUID. The electrical properties of these films were measured using four probe
resistivity set up in the temperature range from 30 K to 400 K. The nanoindentation was used
to study the mechanical properties such as hardness (H), elastic modulus (E), plasticity index
(I-lIE) and resistance to plastic deformation (II 3IE2) of thin films.
Chapter 3 describes the growth and characterization of nanostructured Ni-Mn-In
ferromagnetic shape memory alloy thin films. In this chapter the influence of film thickness on
structural, magnetic, electrical and mechanical properties of nanostructured Ni-Mn-In thin films
was studied. The film thickness was varied from - 90 nm to 655 nm.XRD analyses revealed
that the films exhibit austenitic phase with 1-21 structure at room temperature. The grain size
and crystallization extent increased with corresponding increase in film thickness. The
temperature dependent magnetization and electrical measurements demonstrated the absence
of phase transformation in the film with lower thickness - 90nm which could be due to small
grain size of film. For thickness greater than 153 nm, the films show first order martensitic
phase transition with thermal hysteresis width, which increases with further increase in film
thickness. The field dependent magnetization curves also show the increase in saturation
magnetization (SM). The value of refrigeration capacity (RC) which is an important figure of
merit has been found to be 155.04 mJ/cm3. Maximum exchange bias of 0.0096 T and large
magnetic entropy change AS 1 =l5.2 mJ/cm3 K (field 2 T) at martensitic transition was obtained
for film thickness of 655 ni-n which makes them useful for microelectromechanical systems
(MEMS) applications. Further, nanoindentation studies revealed the higher values of hardness
of 7.2 GPa and elastic modulus of 190 GPa for the film thickness of 153 nm. These findings
indicate that the Ni-Mn-In thin film is potential candidate for various multifunctional properties.
Chapter 4 describes the growth and characterization of Ni-Mn-Sb-Al and Ni-Mn-In-Cr
FSMA thin films. This chapter has been divided into two sections. The first section (section
4.1) describes the effect of aluminium (Al) content on the martensitic transformations and
magnetocaloric effect (MCE) in Ni-Mn-Sb ferromagnetic shape memory alloy (FSMA) thin
films. An increase in mnartensitic transformation temperature (TM) with increasing Al content
was observed from magnetic (M-T) and electrical (R-T) measurements. From the study of
isothermal magnetization (M-H) curves, a large magnetic entropy change (ASi4 of 23 1-fiJ/cm3
K was found in N49 gMn32 97A1443Sbl2 8. A remarkable enhancement of MCE has been attributed
to the significant change in the magnetization of Ni-Mn-Sb films with increasing Al content.
Furthermore, a high refrigerant capacity (RC) was observed in Ni-Mn-Sb-Al thin films as
compared to pure Ni-Mn-Sb. The substitution of Al for Mn in Ni-Mn-Sb thin films with field
iv
induced MCE are potential candidates for micro length scale magnetic refrigeration
applications where low magnetic fields are desirable. Section 4.2 describes the influence of Cr
addition on the structural, magnetic, and mechanical properties as well as magnetocaloric effect
for magnetron sputtered Ni-Mn-In ferromagnetic shape memory alloy thin films. X-ray
diffraction studies revealed that Ni-Mn-In-Cr thin films possessed purely austenitic cubic L21
structure at lower content of Cr, whereas higher Cr content, the films exhibited martensitic
structure at room temperature. The temperature-dependent magnetization (M-T) and resistance
(R-T) results confirmed the monotonous increase in martensitic transformation temperatures
(TM) with the addition of Cr content (0 - 4.5 at %). Further the addition of Cr content
significantly enhanced the hardness (28.2+2.4 GPa) and resistance to plastic deformation H3/E2
(0.261) in Ni504Mn34.961n13.56CrI.08 film as compared with pure Ni-Mn-In film, which could be
due to reduction in grain size, and has been explained in terms of the grain boundary
strengthening mechanism. Further, from the study of isothermal magnetization (M-l-l) curves,
the magnetocaloric effect (MCE) around the martensitic transformation has been investigated.
The magnetic entropy change ASt.i of 7.0 mi/cm3 K was observed in Ni5 I . I Mn3491n9.5Cr4.5 film
at 302 K in an applied field of 2 T. Finally, the refrigerant capacity (RC) was also calculated
for all the films in an applied field of 2 T.
Chapter 5 describes the deposition ofNisoMn368Sbl32/CrN heterostructure thin films
on Si (100) substrate to improve the exchange bias and mechanical properties of Ni-Mn-Sb
ferromagnetic shape memory alloy thin films. The anti ferrom agneti c CrN thickness was varied
from 15 nm-80 nm. The shift in hysteresis loop up to 51 Oe from the origin was observed at 10
K when pure Ni-Mn-Sb film was cooled under a magnetic field of 0.1 T. The observed exchange
bias has been attributed to the coexistence of anti ferromagnetic (AFM) and ferromagnetic (FM)
exchange interactions in the martensitic phase of the film. On the other hand, a significant
shifting of hysteresis loop was observed with AFM CrN layer in Ni5oMn36.8Sb132/CrN
heterostructure. The exchange coupled 140 nrn Ni5oMn368Sb13.2/35nm CrN heterostructure
exhibited relatively large exchange coupling field of 138 Oe at 10 K compared to other films,
which could be due to uncompensated and pinned AFM spins at FM-AFM interface and
different AFM domain structure for different thicknesses of CrN layer. Further nanoindentation
measurements revealed the higher values of hardness and elastic modulus of about 12.7±1.25
- GPa and 179±0.12 GPa in Ni50Mn36.gSbI3.2/CrN heterostructures making them promising
candidate for various multifunctional MEMS devices.
Chapter 6 presents the summary and conclusion of the entire work presented in the
thesis and also proposes the future directions in which these studies can be extended. |
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