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STUDY OF SPRAY DEPOSITED FERROELECTRIC FILMS ON POROUS SILICON

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dc.contributor.author Mishra, Neeraj
dc.date.accessioned 2014-11-30T05:06:13Z
dc.date.available 2014-11-30T05:06:13Z
dc.date.issued 2010
dc.identifier M.Tech en_US
dc.identifier.uri http://hdl.handle.net/123456789/12151
dc.guide Verma, G. D.
dc.guide Nath, Rabinder
dc.description.abstract Ferroelectric oxide materials with a perovskite structure have promising applications in electronic devices such as random access memories, sensors, actuators, infrared detectors, and so on. Recent advances in science and technology of ferroelectrics have resulted in the. feature sizes of ferroelectric-based electronic devices entering into nanoscale dimensions. Generally, ferroelectric ceramics in film form are suitable for the microelectronic applications. The striking photoluminescence properties of porous silicon have attracted considerable research interest since their discovery in 1990. Porous silicon is constituted by a nanocrystalline skeleton (quantum sponge) immersed in a network of pores. As a result, porous silicon is characterized by a very large internal surface area (of the order of 500m2/cm3). This internal surface is passivated but remains highly chemically reactive. This is one of the essential features of this new and complex material. The work in the report presents a new undiscovered area for research on porous silicon as a template for ferroelectric materials deposition. The combination of PS with one or more materials which are also nanostructured due to their deposition within the porous matrix is discussed. Emphasis has been put on macroporous . silicon, offering a, quasi-regular pore arrangement, employed as template for filling with ferroelectric materials. The correlation between morphology and ferroelectric behavior of such semiconducting/ferroelectric systems will be determined. By varying the average size of the pores we can tune - the ferroelectric properties. It has been found that the increase in average pore size increases the remanent polarization of deposited composite film first and saturates later on The optimum value of remanent polarization (Pr) is 41 μC/cm2. The switching kinetics of the composite films have been analyzed by different theoretical model. The switching current; data are fitted well to infinite-grain model (IGM) in the lower time region and deviate in later time region. The nucleation limited switching (NLS) model gives excellent agreement with the experimental polarization reversal transients throughout the whole time range. en_US
dc.language.iso en en_US
dc.subject POROUS SILICON en_US
dc.subject FERROELECTRIC en_US
dc.subject FILM en_US
dc.subject PHYSICS en_US
dc.title STUDY OF SPRAY DEPOSITED FERROELECTRIC FILMS ON POROUS SILICON en_US
dc.type M.Tech Dessertation en_US
dc.accession.number G20340 en_US


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