Please use this identifier to cite or link to this item: http://localhost:8081/xmlui/handle/123456789/8926
Full metadata record
DC FieldValueLanguage
dc.contributor.authorGarg, Sanjay-
dc.date.accessioned2014-11-18T06:31:44Z-
dc.date.available2014-11-18T06:31:44Z-
dc.date.issued1983-
dc.identifierM.Techen_US
dc.identifier.urihttp://hdl.handle.net/123456789/8926-
dc.guideAhmed, K. U.-
dc.description.abstractVarious stages of development in the Very Large Scale Integrated Circuit (VLSI) Technology have been given. Imple-mentation of very large scale integrated circuits has been given right from the initial stage. Lithographic techniques for pattern generation and the use of standard resists and presently employed exposure systems have been discussed. The use of Ga As in VLSI and various technologies towards VLSI like bipolar, N- IROS, C4,O .., SOS etc. are also discussed. Several problems like those of electromigration,in interconnection and packaging techniques are given. The use of computer. Aided Design in VLSI and application of VLSI are also discussed. In the end problems associated with VLSI technology are given and a few suggestions about the area in 'VLSI which need further investigations are pointed out.en_US
dc.language.isoenen_US
dc.subjectELECTRONICS AND COMPUTER ENGINEERINGen_US
dc.subjectVLSI TECHNOLOGYen_US
dc.subjectVLSI-DESIGNen_US
dc.subjectVLSI-APPLICATIONen_US
dc.titleA REVIEW OF VLSI TECHNOLOGYen_US
dc.typeM.Tech Dessertationen_US
dc.accession.number177553en_US
Appears in Collections:MASTERS' THESES (E & C)

Files in This Item:
File Description SizeFormat 
ECD177553.pdf4.31 MBAdobe PDFView/Open


Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.