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dc.contributor.authorGarg, Jitendra-
dc.date.accessioned2014-10-12T09:22:43Z-
dc.date.available2014-10-12T09:22:43Z-
dc.date.issued1996-
dc.identifierM.Techen_US
dc.identifier.urihttp://hdl.handle.net/123456789/6182-
dc.guideSarkar, S.-
dc.description.abstractOutput power of MESFET depends on voltage applied between gate and drain (VGD)' VGD is limited by breakdown voltage between gate and drain. Thus the BVGD is significant factor that limits the output power of a MESFET. The influence of doping profile on the gate-drain breakdown voltage has been studied. It is found that Gaussian distribution of impurity concentration gives rise to very high breakdown voltage. Uniform and complementary error function distribution results in low gate-drain breakdown voltages. Thus, Gussian distribution is preferable for MESFET- substrate.,en_US
dc.language.isoenen_US
dc.subjectELECTRONICS AND COMPUTER ENGINEERINGen_US
dc.subjectBVGDen_US
dc.subjectMESFET GATE-DRAINen_US
dc.subjectBREAKDOWN VOLTAGEen_US
dc.titleA STUDY OF IMPURITY DISTRIBUTION DEPENDENCE OF MESFET GATE-DRAIN BREAKDOWN VOLTAGEen_US
dc.typeM.Tech Dessertationen_US
dc.accession.number247143en_US
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