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Title: | A STUDY OF IMPURITY DISTRIBUTION DEPENDENCE OF MESFET GATE-DRAIN BREAKDOWN VOLTAGE |
Authors: | Garg, Jitendra |
Keywords: | ELECTRONICS AND COMPUTER ENGINEERING;BVGD;MESFET GATE-DRAIN;BREAKDOWN VOLTAGE |
Issue Date: | 1996 |
Abstract: | Output power of MESFET depends on voltage applied between gate and drain (VGD)' VGD is limited by breakdown voltage between gate and drain. Thus the BVGD is significant factor that limits the output power of a MESFET. The influence of doping profile on the gate-drain breakdown voltage has been studied. It is found that Gaussian distribution of impurity concentration gives rise to very high breakdown voltage. Uniform and complementary error function distribution results in low gate-drain breakdown voltages. Thus, Gussian distribution is preferable for MESFET- substrate., |
URI: | http://hdl.handle.net/123456789/6182 |
Other Identifiers: | M.Tech |
Research Supervisor/ Guide: | Sarkar, S. |
metadata.dc.type: | M.Tech Dessertation |
Appears in Collections: | MASTERS' THESES (E & C) |
Files in This Item:
File | Description | Size | Format | |
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247143ECE.pdf | 898.86 kB | Adobe PDF | View/Open |
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