ELLIPSOMETRY STUDY OF OPTICAL PROPERTIES OF MATERIALS(ZnO) USING MACHINE LEARNING

Abstract

Ellipsometry has been widely used by researchers to investigate the optical and microstructural properties of thin films. Ellipsometry is an optical method for measuring the degree to which a polarized light wave transforms after coming into contact with a sample. The effectiveness of ellipsometry measurements made at the ideal angle of incidence as a nondestructive, quantitative, and indirect method for assessing thin films has been established. E. Even though the theoretical underpinnings of SE were discovered morc than 30 years ago. the inexpensive computer revolution allowed for the development of the ellipsometric approach to its current mature stage. The term "spectroscopic" indicates that several wavelengths were utilized in the measurement. Frequent coverage includes the near-IR to near-UV wavelength range. The number of recorded wavelengths often outweighs the number of unknown variables, even for complex multilayer structures. A key advantage of ellipsometry over other optical characterization methods is its capacity to separately detect the relative phase and amplitude change of polarized light brought on by the reflection ofa material. Due to the phase data, ellipsometry is particularly sensitive to compositional non-uniformity since the phase change is more sensitive than the amplitude change to minute changes in the sample surface condition or layer thickness. Ellipsometry often demonstrates monolayer sensitivity to surface change by detecting the relative phase change of the electric field component.