FABRICATION AND EVALUATION OF OHMIC CONTACTS TO SEMICONDUCTORS

Abstract

•iatc contacts are very Important Thr solid sta.ts device fabrication. Contacts have been fabricated by vacuuasporattng gold* tin and *l int * onto the nwtype silicon and gez ania 4 Their VX character-* iatioe have been checked on oscilloscope - sor en and have been plotted using D.C. setup. wroitic ontact- aesiat u s for each contact has been evaluated by •BodywResistanc• cslculotion' method. Contact (n0, Au) shove the best result as erica contact and contact (nsSL, Au) shove the 'rectifying' nature. A jot-electroplating apparatus has been *aatgned and constructed, in order to got plated comic contacts. Further, an attempt has been made to develop + c-contact.reeistance- meter to facilitate the future investigation wait for contact-evaluation.