Please use this identifier to cite or link to this item: http://localhost:8081/jspui/handle/123456789/17413
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dc.contributor.authorModi, Vishal-
dc.date.accessioned2025-06-30T14:30:22Z-
dc.date.available2025-06-30T14:30:22Z-
dc.date.issued2013-06-
dc.identifier.urihttp://localhost:8081/jspui/handle/123456789/17413-
dc.description.abstractPorous nickel structure was observed by a double coating electro deposition process. Firstly porous copper layer was observed when electrodeposition on copper substrate was occurred in "0.05 MCuSO4 ,0.50 M H2SO4" solution. After porous copper deposition nickel was deposited on porous copper substrate in "1.26 M NiSO4,0.I0 M NiCl2,0.60 1-131303" solution. Electrodeposition were done by direct current method at different temperature, kept other parameters constant like pH and current density. Electrodeposition was characterized by scanning electron microscopy (SEM).en_US
dc.description.sponsorshipINDIAN INSTITUTE OF TECHNOLOGY ROORKEEen_US
dc.language.isoenen_US
dc.publisherI I T ROORKEEen_US
dc.subjectElectrodepositionen_US
dc.subjectDirect Currenten_US
dc.subjectPorous Copperen_US
dc.subjectNickelen_US
dc.titleELECTRODEPOSITION OF POROUS COPPER SUBSTRATE AND NICKEL ELECTROCATALYST FOR HYDROGEN EVOLUTION REACTIONen_US
dc.typeOtheren_US
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