Please use this identifier to cite or link to this item: http://localhost:8081/jspui/handle/123456789/17413
Title: ELECTRODEPOSITION OF POROUS COPPER SUBSTRATE AND NICKEL ELECTROCATALYST FOR HYDROGEN EVOLUTION REACTION
Authors: Modi, Vishal
Keywords: Electrodeposition;Direct Current;Porous Copper;Nickel
Issue Date: Jun-2013
Publisher: I I T ROORKEE
Abstract: Porous nickel structure was observed by a double coating electro deposition process. Firstly porous copper layer was observed when electrodeposition on copper substrate was occurred in "0.05 MCuSO4 ,0.50 M H2SO4" solution. After porous copper deposition nickel was deposited on porous copper substrate in "1.26 M NiSO4,0.I0 M NiCl2,0.60 1-131303" solution. Electrodeposition were done by direct current method at different temperature, kept other parameters constant like pH and current density. Electrodeposition was characterized by scanning electron microscopy (SEM).
URI: http://localhost:8081/jspui/handle/123456789/17413
metadata.dc.type: Other
Appears in Collections:MASTERS' THESES (MMD)

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