NANOSTRUCTURED OXIDE THIN FILMS: PREPARATION, CHARACTERIZATION & APPLICATION

Abstract

The work presented in this thesis is based on nano-structured oxide thin films. In the first chapter a pertinent description of thin film is given. PLD technique is used for film fabrication. X-Ray diffractometer, FESEM-EDAX and Premier 11 (Radiant Technology) is used to characterise the thin films, a succinct description of all the instruments is given in introductory chapter. BFO (BiFe03) and BTO (Bi.T6012) materials are chosen for thin film - fabrication. BiFe03 and BTO's, bulk and thin film preparation and all the characterization are given in chapter 2 and chapter 3 respectively. Experimental and theoretical results are discussed in both the chapters. Chapter 4 includes the application part of oxide thin films, MRAM technology is described and a firm comparison of MRAM with other technologies of computer memories is given. Finally a conclusion of complete work is given in the last. To develop an understanding of the work, a number of review papers, research papers, books and Internet sources are referred; a complete list of references is given at the last of thesis.