OXIDATIVE REMOVAL OF 4-NITROPHENOL USING PHOTO FENTON PROCESS

Abstract

In the present study the Photo-Fenton process was used as a treatment method to treat synthetic wastewater containing 4-nitrophenol (4-NP). The effects of oxidant (H2O2 and Fe2+) dosages, pH and initial 4-nitrophenol concentration on the decomposition of 4-NP were investigated. About 76% and 80% of 4-NP was readily decomposed when the reaction was carried out at an oxidant concentrations of H2O2 (9mM) and Fe2+ (1mM) for 90 minutes. The optimum pH value was found to be around 3. The effect of initial concentration of 4-nitrophenol were investigated and found that about 80.25% were degraded when the initial concentration of 4-nitrophenol was 0.5mM which then decreased at increased 4-nitrophenol initial conc. The TOC removal with variation in dosages of H2O2, Fe2+ and initial 4-nitrophenol were also investigated. NaNO2 was used to stop further oxidation reaction in the solution and H2SO4 or NaOH were used to adjust the required pH of solution. Keywords: 4-Nitrophenol, Fenton, Photo-Fenton, H2O2, Fe2+, TOC