Please use this identifier to cite or link to this item: http://localhost:8081/jspui/handle/123456789/12127
Full metadata record
DC FieldValueLanguage
dc.contributor.authorJain, Kavita-
dc.date.accessioned2014-11-29T08:39:35Z-
dc.date.available2014-11-29T08:39:35Z-
dc.date.issued1989-
dc.identifierM.Techen_US
dc.identifier.urihttp://hdl.handle.net/123456789/12127-
dc.guideTandon, V. K.-
dc.guideSarkar, S.-
dc.description.abstractThe Metal-O xide-Semiconductor Field-Effect Transistor (MOSFET) is the most important device for very large scale integ-rated circuits such as : microprocessors and semiconductor memory. MOSFET is also becoming an important power device. It has many acronyms Including IGFET (Insulated-gate Field-effect transistor), MISFET (metal-insulator-semiconductor transistor). Because current in the MOSFET is transported prt:dominantly by carriers of one polarity only(e.g. electrons in an n-channel device), the MOSFET is usually referred to as a unipolar device, the other members of the family of field effect transistors being JFE7A and MOSFETs. MOSFETs have been built in various semiconductors such as Ge, Si, InP, InGaAs and GaAs. Various insulators such as 5102, Si3N4 and f A1203 have been used for gate insulation. The most successful system is the Si-Si02 combination.en_US
dc.language.isoenen_US
dc.subjectHIGH FIELD EFFECTSen_US
dc.subjectMOSFETen_US
dc.subjectVLSIen_US
dc.subjectPHYSICSen_US
dc.titleTHE STUDY OF HIGH FIELD EFFECTS IN MOSFETen_US
dc.typeM.Tech Dessertationen_US
dc.accession.number246344en_US
Appears in Collections:MASTERS' THESES (Physics)

Files in This Item:
File Description SizeFormat 
PHD246344.pdf1.99 MBAdobe PDFView/Open


Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.